MONTEREY, Calif. — Hoping to take a lead in the next-generation lithography (NGL) race, Japan's Nikon Corp. today announced what appears to be the world's first photomask blank for exposure tools ...

BILLERICA, Mass.--(BUSINESS WIRE)--Entegris, Inc. (NASDAQ: ENTG), a leader in specialty chemicals and advanced materials solutions for the microelectronics industry, today released the next generation ...

After many years of hearing that EUV is almost ready for prime time, the tide is finally coming in. A decade of slow but steady progress has resulted in exposure tools that can expose on the order of ...

To view the multimedia assets associated with this release, please click: http://www.multivu.com/players/English/7065552-kla-tencor-wafersight-5d-patterning-control ...

LITHOSCALE XT provides up to five-fold increase in throughput versus previous industry benchmark LITHOSCALE system; EVG maskless exposure technology to be highlighted at ECTC 2025 The LITHOSCALE® XT ...

Experts at the Table: Semiconductor Engineering sat down to discuss extreme ultraviolet (EUV) lithography and other next-generation fab technologies with Jerry Chen, head of global business ...

The license agreements resolve disputes related to reticle pod technology Entegris provides advanced materials and process solutions to the semiconductor and other high-technology industries. (Credit: ...

Applied Materials, Inc. advanced the state-of-the art in photomask technology with its new Applied Centura Tetra EUV Advanced Reticle Etch system. Overcoming a major hurdle to the adoption of EUV ...

Modern photolithography machines must deliver extraordinary precision on a repeatable basis, and in high volume production. In response to demands for increased throughput in the semiconductor ...

BILLERICA, Mass.--(BUSINESS WIRE)--Entegris, Inc. (NASDAQ: ENTG), a world-class supplier of advanced materials and process solutions for the semiconductor and other high-technology industries, ...