Semiconductor Engineering

Process Variation Analysis Of Device Performance Using Virtual Fabrication — Methodology Demonstrated On A CMOS 14-nm FinFET Vehicle

A new methodology to assess the impact of fabrication inherent process variability on 14-nm fin field effect transistor (FinFET) device performance. August 18th, 2021 - By: Coventor A new methodology ...
EDN

Nanometer CMOS process variations: are they inevitable, or a symptom or immaturity?

For some time now it has been assumed by a lot of people that the growing process variations at advanced CMOS nodes were an inevitable result of physics, and therefore, like death, taxes and ...
Semiconductor Engineering

Effects Of A Random Process Variation On The Transfer Characteristics Of A Fundamental Photonic Integrated Circuit Component

Silicon photonics uses existing CMOS manufacturing infrastructure and techniques but lacks mature models that take into account known CMOS process variations and their effect on photonic component ...
Nature

Low Power Design in CMOS and FinFET Logic Circuits

Low power design has become a cornerstone of modern integrated circuit development, driven by energy efficiency demands and the challenges of scaling in nanometre technologies. Innovations in ...